John Howe, a junior majoring in Electrical Engineering at the University of Notre Dame, has been awarded a 2024 fellowship from SUPREME (Superior Energy-Efficient Materials and Devices), Cornell University’s microelectronics research center.
The fellowship supports travel and networking opportunities as well as material and tooling costs associated with Howe’s work in the Notre Dame Nanofabrication Facility with the Nano Electronic Devices and Systems (NEEDS) lab.
Howe’s research focuses on improving the fabrication process and performance of ferroelectric capacitors using innovative materials and deposition techniques. His work has applications in memory technologies, AI accelerators, and neural networks. He is currently working on reducing voltage disturbances in ferroelectric capacitor arrays to increase ferroelectric RAM storage capacity.
“John has published and presented a paper at an international conference and contributed to work at a top device conference,” said Kai Ni, assistant professor of electrical engineering and Howe’s advisor. “John’s research has identified interesting and important directions, which have been recognized by the leadership of SUPREME.”
In addition to pursuing fundamental new science and novel engineering technologies in the semiconductor industry, SUPREME is dedicated to training the next generation of scientists and engineers to work across disciplines.
— Karla Cruise, Notre Dame Engineering